ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 19    No. 2    April 2009

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Properties of nanocrystalline copper prepared by vacuum-warm-compaction method
CHU Guang(楚 广)1, 2, LIU Wei(刘 伟)1, YANG Tian-zu(杨天足)1, TANG Yong-jian(唐永建)2
(1. School of Metallurgical Science and Engineering, Central South University, Changsha 410083, China;
2. Research Center of Laser Fusion of CAEP, Mianyang 621900, China
)
Abstract:  Nanocrystalline Cu with average grain size of 22.8−25.3 nm was prepared by vacuum-warm-compaction method. Scanning electronic microscope, HMV-2 type microhardness tester, X-ray diffractometer, and 6157 type electrometer were used to determine the microstructure, microhardness and electrical resistivity of as-prepared nanocrystalline Cu, respectively. The results show that the microhardness of nanocrystalline Cu increases with larger pressure, longer duration of pressure or higher temperature. The highest microhardness of nanocrystalline Cu is 3.8 GPa, which is 7 times higher than that of coarse-grained copper. The electrical resistivity of as-prepared specimens is (1.2−1.4)×10−7 Ω·m at temperature 233−293 K, which is 5−6 times higher than that of the coarse-grained copper.
Key words:  vacuum-warm-compaction; nanomaterials; microhardness; electrical resistivity
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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