EFFECT OF BORON ON MICROSTRUCTURE AND PROPERTIES OF Ti-N FILM
(1.Material Test and Research Center; Hunan University; Changsha 410082
2. Central South University of Technology; Changsha 410083)
2. Central South University of Technology; Changsha 410083)
Abstract: By adding boron to the Ti-N film, a nanocrystalline multiphase composite Ti-B-N film was deposited using activation ion plating under different negative bias voltages. It is found that the mechnical properties of the Ti-B-N film are much better than that of the Ti-N film. Diffraction measurements show that the composite film consists mainly of TiN with dispersed TiB, cubic BN and Ti-B-N phases. SEM and TEM micrographs indicate that the Ti-B-N film has a dense fine nanocrystalline structure and also a dense close interfacial bonding of the film to substrate. The results of AES and EPMA show that a diffusion zone exists at the film/ substrate interface and the higher the negative bias voltage, the wider the diffusion zone.
Key words: boron Ti N film nanocrystalline multiphase composite