ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 18    No. 4    August 2008

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Pulse-plating electrodeposition and annealing treatment of CuInSe2 films
LIU Fang-yang(刘芳洋), LÜ Ying(吕 莹), ZHANG Zhi-an(张治安),
LAI Yan-qing(赖延清), LI Jie(李 劼), LIU Ye-xiang(刘业翔)
(School of Metallurgical Science and Engineering, Central South University, Changsha 410083, China)
Abstract: CuInSe2 (CIS) thin film was prepared on molybdenum substrate using pulse-plating electrodeposition in aqueous solution. The most suitable pulse potential range for co-deposition is found to be from −0.55 to −0.75 V (vs SCE) from linear potential scanning curve. The electrodeposited films were characterized by X-ray diffractometry (XRD), scanning electron microscopy(SEM) and energy dispersive X-ray analysis (EDS). The annealing effects on electrodeposited precursors were investigated. And the influence of pulse parameters on film quality was studied. The chalcopyrite phase CuInSe2 films with smooth surface and stoichiometric composition are obtained at a pulse potential from −0.65 to −0.7 V (vs SCE), a pulse period of 1−9 ms with a duty cycle of 33% and annealing treatment.
Key words: CuInSe2; thin films; pulse-plating electrodeposition; annealing; solar cells
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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