Effect of sputtering pressure and rapid thermal annealing on optical properties of Ta2O5 thin films

ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 19 No. 2 April 2009

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Effect of sputtering pressure and rapid thermal annealing on
optical properties of Ta₂O₅ thin films

ZHOU Ji-cheng(周继承), LUO Di-tian(罗迪恬), LI You-zhen(李幼真), LIU Zheng(刘正)

(School of Physics Science and Technology, Central South University, Changsha 410083, China)

Abstract: Ta₂O₅ thin films were deposited by DC reactive magnetron sputtering followed by rapid thermal annealing(RTA). Influence of sputtering pressure and annealing temperature on surface characteristics, microstructure and optical property of Ta₂O₅ thin films were investigated. As-deposited Ta₂O₅ thin films are amorphous. It takes hexagonal structure (δ-Ta₂O₅) after being annealed at 800 ℃. A transition from δ-Ta₂O₅to orthorhombic structure (L-Ta₂O₅) occurs at 900−1 000 ℃. Surface roughness is decreased after annealing at low temperature. Refractive index and extinction coefficient are decreased when annealing temperature is increased.

Key words: Ta₂O₅ thin films; DC reactive magnetron sputtering; sputtering pressure; rapid thermal annealing(RTA)

Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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