ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 15    No. 2    April 2005

[PDF]    [Flash]
Effect of silicon on oxidation of Ni-15Al alloy
WU Ying(吴 莹) , NIU Yan(牛 焱), WU Wei-tao(吴维 )
(State Key Laboratory for Corrosion and Protection, Institute of Metal Research, 
Chinese Academy of Sciences, Shenyang 110016, China
)
Abstract: The oxidation of binary Ni-Al alloy containing 15%(mole fraction, the same below if not mentioned) Al (Ni-15Al), and of a ternary alloy with the same Al content but also containing 4% Si (Ni-4Si-15Al) has been studied at 1000℃ under 1.0×105Pa O2 to examine the effect of the addition of Si on the oxidation of Ni-15Al. Oxidation of Ni-15Al produces a duplex scale composed of an outer NiO layer and an inner layer riched in Al2O3. On the contrary, Ni-4Si-15Al forms an external alumina layer directly in contact with the alloy presenting only trace of NiO and the Ni-Al spinel. As a result, the kinetics of Ni-15Al shows a fast initial stage followed by two subsequent parabolic stages with decreasing rate constants, while Ni-4Si-15Al presents essentially a single nearly-parabolic behavior with a rate constant similar to that of the final stage of Ni-15Al. Therefore, the addition of 4% Si significantly reduces the oxidation rate during the initial stage by preventing the formation of Ni-riched scales and promoting an earlier development of an exclusive external alumina layer on the alloy surface. 
Key words: Ni-Si-15Al; ternary alloy; oxidation
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
Managed by Central South University (CSU) 湘ICP备09001153号-9