ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 15    No. 2    April 2005

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Critical misfit of epitaxial growth metallic 
thin films
LI Jian-Chen(李建忱), LIU Wei(刘 伟), JIANG Qing(蒋 青)
(Key Laboratory of Automobile Materials, Ministry of Education;
Department of Materials Science and Engineering, Jilin University, 
Changchun 130025, China
)
Abstract:  The critical misfit of epitaxial growth metallic thin films fc was thermodynamically considered. It is found that there exists a competition between the energy of the misfit dislocation of film and non-coherent interface energy of film-substrate. Equilibrium between these energies was present at a critical atomic misfit fc. When the atomic misfit is larger than the critical value, epitaxial growth does not occur. The critical misfit of the epitaxial growth thin films can be predicted. The results show that fc is proportional to the non-coherent interface energy of the film-substrate, and inversely proportional to the elastic modulus and the thickness of the film.
Key words: epitaxial growth film; atomic misfit; dislocation; interface energy
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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