ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 15    No. 5    October 2005

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Microstructure and physical properties of PVD TiN/(Ti, Al)N multilayer coatings
WU En-xi(吴恩熙)1, CHEN Li(陈 利)1,2
YIN Fei(尹 飞)1,2, WANG Xiu-quan(汪秀全)1
(1. State Key Laboratory of Powder Metallurgy, Central South University, 
Changsha 410083, China; 
2. Zhuzhou Cemented Carbide Cutting Tools Co., LTD, Zhuzhou 412007, China
)
Abstract:  Magnetron sputtered (Ti, Al)N monolayer and TiN/(Ti, Al)N multilayer coatings grown on cemented carbide substrates were studied by using energy dispersive X-ray spectroscopy(EDX), scanning electron microscopy(SEM), nanoindentation, Rockwell A indentation test, strength measurements and cutting tests. The results show that the (Ti, Al)N monolayer and TiN/(Ti, Al)N multilayer coatings perform good affinity to substrate, and the TiN/(Ti, Al)N multilayer coating exhibits higher hardness, higher toughness and better cutting performance compared with the (Ti, Al)N monolayer coating. Moreover, the strength measurement indicates that the physical vapour deposition (PVD) coating has no effect on the substrate strength.
Key words:  PVD; (Ti, Al)N monolayer coating; TiN/(Ti, Al)N multilayer coatings; cemented carbide
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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