ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 11    No. 4    August 2001

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Oxygen diffusion in c-textured
epitaxial YBa2Cu3O7-δ thin films
LI Li(李 力), ZHOU Jian(周 健), DONG Xue-bin(董学斌), YUAN Run-zhang(袁润章)
(State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,
Wuhan University of Technology, Wuhan 430070, P.R.China
)
Abstract: Isothermal oxygen in-diffusion in c-textured epitaxial YBa2Cu3O7-δ thin films was studied by in situ X-ray diffraction. Thermal expansion coefficients of c-axis length with different oxygen contents are αc (6.91, O2)=19.1×10-6K-1and αc(6.0, N2)=19.3×10-6 K-1 respectively. Chemical diffusion process of oxygen was described by relaxation time. From the Arrhenius plot of relaxation time, an activation energy of lattice diffusion was obtained as 1.1eV,which is close to the results of SIMS (0.95 eV) and internal friction (1.02 eV).
Key words: oxygen diffusion; in situ X-ray diffraction; relaxation time
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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