ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 11    No. 4    August 2001

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Electrochemical behavior of electroplated Zn-P alloy
ZHANG Zhao(张 昭)
(Department of Chemistry, Zhejiang University, Hangzhou 310027, P.R.China)
Abstract: The electroplating behavior of Zn-P alloy on copper from light acid chloride solutions (LACS) was investigated using cyclic voltammetry and linear potential sweep method. It is found that, under the experimental conditions, the concentrations of H3PO3 and ascorbic acid in LACS change the codeposition mechanism of Zn-P alloy, the addition of H3PO3 into LACS promotes the three-dimentional (3-D) instantaneous nucleation/growth, while the addition of ascorbic acid promotes the two-dimentional (2-D) instantaneous nucleation and layer-by-layer growth. H3PO3 and zinc ions inhibit the deposition each other. The experimental results also show that H3PO3 in the LACS can be reduced on the cathode individually, and low pH value of the LACS promotes the reduction of H3PO3.
Key words: Zn-P alloy; codeposition; electrochemical behavior
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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