ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 20    No. 1    January 2010

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Si diffusion behavior during laser welding-brazing of Al alloy and Ti alloy with Al-12Si filler wire
CHEN Shu-hai(陈树海), LI Li-qun(李俐群), CHEN Yan-bin(陈彦宾), LIU De-jian(刘德健)
(State Key Laboratory of Advanced Welding Production Technology,
Harbin Institute of Technology, Harbin 150001, China
)
Abstract: In laser welding-brazing of Al alloy (5A06) and Ti alloy (Ti-6Al-4V) with rectangular CO2 laser spot and with Al-12Si filler wire, element Si enriches at the interface between Ti substrate and the filler metal. It is found that the Si diffusion behavior has a significant effect on the formation of interfacial intermetallic compounds. To analyze the Si diffusion behavior, a model for the prediction of the chemical potential for ternary alloy was established. According to the calculated results of the influence of the element content and temperature in Ti-Al-Si system on Si chemical potential, the diffusion behavior of Si element was analyzed for Ti dissolution and melting mode, which presents a good agreement with the experimental data. Further, formation mechanism of the interfacial intermetllic compound was clarified.
Key words: laser welding-brazing; diffusion behavior; chemical potential; interfacial reaction
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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