ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 10    No. 3    June 2000

[PDF]    [Flash]
Crystallization of NiTi shape memory alloy sputtering-deposition film①
QIU Ping-shan(邱平善), SONG Run-bin(宋润滨), HUANG Wei-xin(黄渭馨),
(LI Yun-xi(李运稀), WANG Gui-song(王桂松), YU Wei-dong(于伟东))
Abstract: The crystallization of NiTi shape memory alloy sputter-deposition film in the course of sputtering-deposition and that after heat-treated were studied. The relationship between the process factors, such as substrate type, temperature, as well as the crystallization when heat treated after plating was investigated. The results show that a new phase precipitates during heat treatment after sputtering deposition and the degree of crystallization among different layers and the stress in grains are obviously different.
Key words: sputtering-deposition films; crystallization; shape memory alloys
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
Managed by Central South University (CSU) 湘ICP备09001153号-9