ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 10    No. 4    August 2000

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Emission spectra of microwave plasma and
MPCVD transparent diamond film①
ZHOU Jian(周 健)1, HE Wei(何 伟)2, YUAN Run-zhang(袁润章)1,
JIANG De-sheng(姜德生)2, WANG Jian-hua(汪建华)1
(1. State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,
Wuhan University of Technology, Wuhan 430070, P.R.China;
2. Fiber Optic Sensing Technology Research Center, Wuhan University of Technology,
Wuhan 430070, P.R.China
)
Abstract: The emission spectra of microwave plasma was in-line measured in visible light wave-band using a self-made optical fiber spectrometer, the change rule of the atomic hydrogen (H) and double-carbon radical(C2) was given under different CH4/H2ratios of volume flow. The effect of atomic hydrogen (H) on CVD diamond, deposited high quality and transparent diamond film by microwave plasma CVD (MPCVD) was analyzed according to the measured results by scanning electron microscopy(SEM), laser Raman spectrometry(Raman), and Fourier transform infrared spectrometry (FTIR). The results showed that the diamond film consisted of (220) orientation and it was homogeneous, compact, low-defective, high-quality film, its infrared transmissibility was about 70%, approached theoretical transmissibility of diamond. It was key conditions that a large number of atomic hydrogen (Hγ) and double-carbon radical(C2) exist in the
course of high quality diamond film growth. The research provided a rapid method for technology exploration of microwawe plasma CVD, and a reliable basis for research on growth mechanism of diamond film.
Key words: emission spectra;Hγ;C2; MPCVD; tansparent diamond film
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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