ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 9    No. 4    December 1999

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Deposition of tungsten-titanium carbides on surface of diamond by reactive PVD
Hu Guorong(胡国荣); Yang Jianhong(杨建红); Liu Yexiang(刘业翔); Yang Kaihua(杨凯华); Tang Fenglinx(汤凤林); Jin Jihong(金继红)
(Department of Nonferrous Metallurgy; Central South University of Technology; Changsha 410083; P. R. China;
Institute of Technology; China University of Geosciences; Wuhan 430074; P.
)
Abstract: The coatings of W-Ti carbides on the surface of diamond was obtained by using physical vapor deposition (PVD), during which WO3 powders pre-treated with hydrofluoric acid were reduced by titanium hydride in vacuum at 850 ℃. The resistance of diamond to corrosion at high-temperature was investigated. The formation of W-Ti carbides on the surface of diamond was verified by X-ray diffraction analysis, the interface state between diamond and matrix in metaLbase diamond composite was observed by scanning electron microscope. The results showed that the carbide coating is easy to be formed at low deposition temperature on the surface of diamond, while the resistance of diamond to corrosion at highutemperature and the strength of bonding between diarnond and metal matrix are effectively improved.
Key words:  diamond; physical vapor deposition (PVD); tungsten carbides; tungsten
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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