ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 8    No. 2    June 1998

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EFFECT OF CURRENT DENSITY ON AMORPHOUS Al-Mn ELECTRODEPOSITON
Li Jianchen, Lu Xiaoxia and Jiang Qing
(Department of Materials Science and Engineering, Jilin University of Technology, Changchun 130025, P. R. China)
Abstract: Amorphous Al-Mn electrodeposition on steel plate was obtained with a molten salt. It was shown that during the electrodeposition, current efficiency, electrodeposition composition, electrodeposition structure and electrodeposition thickness are influenced by current density during the electrodeposition; as the current density increases, Mn content in the electrodeposition decreases; the thickness of the plating layer increases as the current density increases in a certain range; the current efficiency is up to its maximum (90%) when the current density is 45 mA/cm2.
Key words: current density amorphous Al-Mn electrodeposition composition of electrodeposition
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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