Deposition of chromium aluminum nitride coatings by arc ion plating
(1. Jiangxi Key Laboratory of Surface Engineering, Jiangxi Science and Technology Normal University,
Nanchang 330013, China;
2. Department of Materials Science and Engineering, Nanchang Institute of Aeronautical Technology,
Nanchang 330063, China)
Nanchang 330013, China;
2. Department of Materials Science and Engineering, Nanchang Institute of Aeronautical Technology,
Nanchang 330063, China)
Abstract: Cr-Al-N ternary coatings were deposited by arc ion plating method using isolated Cr target and Al target. The influence of AlN content on the phase change was studied by synthesizing Cr1−xAlxN coatings with different x values. The effects of substrate negative bias on the surface morphology, deposition rate and phase structure were investigated. As the aluminum content increases, the structure of (Cr1−xAlx)N changes from B1(NaCl) phase to B4(wurtzite) phase. The critical content of AlN solubilized in B1(NaCl) lattice is close to 0.7. With the increasing pulse negative bias, the deposition rate decreases constantly, the droplet contamination is more serious, the ion-etching effect on coating surface is more obvious, and the change of preferred orientation and the shift of XRD peak take place.
Key words: chromium aluminum nitride; arc ion plating; phase change; pulse bias