ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 20    No. 10    October 2010

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Effects of annealing temperature on microstructure and
ferroelectric properties of Bi0.5(Na0.85K0.15)0.5TiO3 thin films
GONG Yue-qiu(龚跃球)1, ZHENG Xue-jun(郑学军)1, 2, GONG Lun-jun(龚伦军)1, MA Yin(马 颖)1,
ZHANG Da-zhi(张大志)1, DAI Shun-hong(戴顺洪)
(1. Faculty of Materials, Optoelectronics and Physics, Xiangtan University, Xiangtan 411105, China;
2. Key Laboratory of Low Dimensional Materials and Application Technology of Ministry of Education,
Xiangtan University, Xiangtan 411105, China
)
Abstract: Bi0.5(Na0.85K0.15)0.5TiO3 (BNKT15) thin films were synthesized by metal-organic decomposition (MOD) at annealing temperatures of 650, 680, 710 and 740 °C, and the effects of annealing temperature on the microstructure, dielectric properties, remnant polarization (2Pr) and leakage current density were studied with X-ray diffractometer, atomic force microscope, precision impedance analyzer, ferroelectric analysis station and semiconductor parameter tester. The results show that the thin film annealed at 710 °C exhibits a typical perovskite structure without predominant orientation and a smooth surface with evenly distributed grains. 2Pr value (67.4 μC/cm2 under 830 kV/cm) and the leakage current density (1.6×10−6 A/cm2 at 170 kV/cm) for BNKT15 thin film annealed at 710 °C are better than those for thin films annealed at other temperatures.
Key words: BNKT15 thin film; metal-organic decomposition; annealing temperature; remnant polarization; leakage current density
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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