ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 21    No. 2    February 2011

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Growth of CuI buffer layer prepared by spraying method
YAN You-hua, LIU Ying-chun, FANG Ling, LU Zhi-chao, LI Zheng-bang, ZHOU Shao-xiong
(China Iron and Steel Research Institute Group, Advanced Technology and Materials Co., Ltd., Beijing 100081, China)
Abstract: CuI thin films with nano-scale grains of about 35nm were deposited via spraying method with using acetonitrile as solvent. The influence of iodine doping concentration in acetonitrile solution on the structure, topographic and optical properties of CuI thin films was investigated. X-ray diffraction results showed that CuI iodine-doped films doped CuI׃I2 were in γ-phase of zinc blende structure with (111) preferential plane. Scanning electron microscopy revealed that the microstructure of CuI films depended on the relative amount of doping iodine in the solution. When the iodine doping amount in acetonitrile solution was 0.025 g, the film was uniform and compact, the optical transmittance was 75.4% in the part of visible region and the energy band gap was close to 2.96 eV.
Key words: CuI thin film; buffer layer; spraying method; iodine doping
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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