Fabrication of curved micro structures on photoresist layer
(Nano Mechanical Systems Research D, ivision, Korea Institute of Machinery and Materials (KIMM),
Daejeon 305-343, Korea)
Daejeon 305-343, Korea)
Abstract: A novel fabrication process for micro patterns with curvature was introduced. The curved structures were made by compensating rectangular micro structures with liquid photoresist layer. Because of the surface tension of the liquid in micro scale, various shapes of meniscus can be made on the micro channels. The micro channels were made on the silicon substrate in advance, and then the liquid layer was coated on the micro channels. From the nature of liquid behavior, the curved patterns with smooth surface are obtained, which cannot be made easily with the conventional mechanical machining, as well as with the microfabrication processes, such as wet and dry etching. With this principle, it is expected that the smooth and curved surfaces can be made by simple processes and the results can be applied widely, such as optical patterns.
Key words: micro pattern; liquid layer; MEMS; micro channel; silicon substrate