ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 16    Special 1    June 2006

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Fabrication of grating waveguide using photopolymerization
姚书山1,秦晓燕1,于晓强1,许光辉1,王泽岩1,荆象阳1,黄柏标1,张奇2,董毅3,孙渝明3
(1.State Key Laboratory of Crystal Materials, Shandong University, Ji’nan 250100, China2.西安矿业学院3.Department of Optics, Shandong University, Ji’nan 250100, China)
Abstract: Two ternary materials systems, which comprise photoinitiator/two-photon initiators, oligomer and binder were prepared. Polymeric waveguide film was manufactured by spinning the materials on optical glass (refraction index=1.5), the two-photon initiated photopolymerization (TPIP) and single-photon holographic photopolymerization were carried out respectively in the polymer waveguide film. The preparation of these materials was explained and absorption spectra were tested. The experimental results including the micrographs and diffraction patterns verifying the formation of grating waveguide structures were given. The results show that grating waveguide microstructures can be holographically fabricated by single-photon photopolymerization with low-power (tens mW ) continuous-wave (CW) laser at 532 nm successfully. Because the continuous-wave laser at 532 nm is handier than one at 514 nm.
Key words: two-photon initiated photopolymerization; grating waveguide
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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