Phase and microstructure of CVD alumina-silica coating deposited at relative low temperature
(1.Ningbo Branch of Ordnance Science Institute of China, Ningbo 315103, China2.中国核动力院核燃料及材料重点实验室，成都610041)
Abstract: Alumina-silica composite coatings were prepared on the surface of graphite paper by CVD using AlCl3/SiCl4/H2/CO2 as precursor in the temperature range of 300 to 550℃. XRD and SEM were used to examine the phase composition and the microstructure of the coating, respectively. The results indicate that the dense, uniform and adherent alumina-silica composite coating can be prepared on graphite paper substrate by CVD at 550℃ using SiCl4/AlCl3/CO2/H2. The alumina-silica composite coating is composed of a number of spherical particles. Each particle is composed of a number of fine-particle. The phase of the 550℃ composite coating includes γ-alumina containing amorphous silica. The content of Cl element in composite coating decreases with the increase of the deposition temperature. The analysis results of morphology and growth mechanisms of the CVD alumina-silica indicate that the condensation within the boundary layer will be more likely to lead to the formation of gel-particles. The gel-particles size decreases with the increase of deposition temperature in the range of 300550℃. Surface reaction is the main path to generate deposition products at 550℃.
Key words: alumina-silica composite coating； phase； microstructure； CVD； low temperature