Ceramic alloying with Ti-N deposition and diffusion of multi-layers by plasma surface alloying technique
(1.Guilin University of Electronic Polytechnic Guilin 510014 China2.太原理工人学表面工程研究所，太原030024)
Abstract: High quality TiN multi-layer was obtained on steel substrate by combined technology of plasma glow discharge sputtering, hollow cathode effect and interfacial diffusion. The TiN multi-layer consists of deposition layer and diffusion layer. Its morphology, structure and chemical compositions were analyzed. The microhardness and wear resistance were measured. The results indicate that the diffusion of Ti and N into the substrate leads to a strong interfacial adhesion. The thickness of TiN multi-layer is about 10μm. The strongest diffraction is on the (200) crystal plane of TiN. The surface hardness is about to 2300(HV_ 0.1). The wear resistance of the TiN ceramic alloying multi-layer is excellent and the friction coefficient is low under dry sliding conditions.
Key words: plasma glow discharge； hollow cathode effect； TiN； diffusion layer； wear resistance