Dynamic scaling behavior of iron nitride thin films prepared by magnetron sputtering and ion implantation
(1.黑龙江省哈尔滨市哈尔滨工业大学材料科学与工程学院2.School of Astronautics, Harbin Institute of Technology, Harbin 150001, China3.School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China)
Abstract: Under far from equilibrium conditions, the formation mechanism of solid can be studied in terms of the dynamic scaling theory. The roughness and dynamic scaling behavior of the Fe-N thin films were studied by atomic force microscopy and grazing incidence X-ray scattering. The results indicate that the roughness of the surface increases with increasing sputtering time during the course of magnetron sputtering, and the surface exhibits a fractal characteristic. While the Fe-N films prepared by compound technology—combining magnetron sputtering with plasma based ion implantation are not in agreement with the fractal theory.
Key words: dynamic scaling behavior； grazing incidence X-ray scattering； iron nitride film； ion implantation