Growth and crystallization behaviors of anodic oxide films on putter-deposited titanium at very low potentials
(School of Chemistry and Chemical Engineering, South China University of Technology, Guangzhou 510640, China)
Abstract: Growth and crystallization of titanium anodized films were studied by performing the anodization of the sputter-deposited titanium samples under cyclic voltammetry (CV) mode at very low potentials. The surface features, crystalline behaviors and chemical compositions of the formed anodic oxide layers were detected by AFM, SE and XPS. It was found that the structure of the titanium anodized films is crystalline, even though the maximum oxidation potential (φmax) is very low (as low as 1000 mV). Both enlarging the applied voltage and reducing the potential scanning rate are beneficial for the growth and crystallization of titanium oxide films. It was thought that the internal compressive stress, other than the local joule heating accepted for many researchers, is the main force of stimulating the crystallization of anodic titanium oxide films at very low potentials.
Key words: anodization; sputter-deposited titanium; crystallization; low potential; cyclic voltammetry (CV)