Effect of deposition parameters on micro- and nano-crystalline diamond films growth on WC-Co substrates by HFCVD
(School of Mechanical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China)
Abstract: The characteristics of hot filament chemical vapor deposition (HFCVD) diamond films are significantly influenced by the deposition parameters, such as the substrate temperature, total pressure and carbon concentration. Orthogonal experiments were introduced to study the comprehensive effects of such three parameters on diamond films deposited on WC-Co substrates. Field emission scanning electron microscopy, atomic force microscopy and Raman spectrum were employed to analyze the morphology, growth rate and composition of as-deposited diamond films. The morphology varies from pyramidal to cluster features with temperature decreasing. It is found that the low total pressure is suitable for nano-crystalline diamond films growth. Moreover, the substrate temperature and total pressure have combined influence on the growth rate of the diamond films.
Key words: hot filament chemical vapor deposition (HFCVD); diamond films; WC-Co substrates; deposition parameters