ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 25    No. 3    March 2015

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Electroplating mechanism of nanocrystalline NdFeB film
Zhong-nian YANG1,2, Cui WANG2, Yan ZHANG1, Yan XIE1
(1. Department of Chemical Engineering, Binzhou University, Binzhou 256603, China;
2. College of Chemistry, Chemical Engineering and Materials Science,
Shandong Normal University, Ji’nan 250014, China
)
Abstract: Nanocrystalline NdFeB film was fabricated onto the copper substrate through direct current electroplating method, and characterized by scanning electron microscope (SEM) coupled with energy dispersive X-ray spectroscope (EDS), vibrating sample magnetometer and potentiodynamic polarization techniques. The initial electroplating behavior was investigated by cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS) techniques. Results revealed that the corrosion resistance of the NdFeB film was better than that of the traditional sintered NdFeB magnet. The depositing process of the NdFeB film followed the three-dimensional nucleation and subsequent grain growth mechanism, and was controlled by charger transfer. With the increase of the negative potential bias, the deposition mechanism of NdFeB film changed from heterogeneous to homogeneous nucleation/growth, which consequently resulted in the decrease of charge-transfer-resistance.
Key words: NdFeB film; electrodeposition; corrosion; magnetic property
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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