Aluminium electrodeposition under novel conditions from AlCl3-urea deep eutectic solvent at room temperature
(1. Institute of Chemistry, Technology and Metallurgy, National Institute, Department of Electrochemistry, University of Belgrade, Belgrade, Serbia;
2. Nissan Technical Center North America, Inc., 39001 Sunrise Drive, Farmington Hills, MI 48331-3487, USA)
2. Nissan Technical Center North America, Inc., 39001 Sunrise Drive, Farmington Hills, MI 48331-3487, USA)
Abstract: The electrodeposition of aluminium on glassy carbon and aluminium substrates from AlCl3-urea deep eutectic solvent (DES) system at near room temperatures was investigated, without additional purification of the chemicals used to prepare the electrolyte and without rigorous control of moisture and oxygen present in the working space. The effects of changing temperature, working potential, controlled deposition current density and deposition time on the morphology of deposited aluminium without stirring of the electrolyte were recorded. Using potentiostatic and galvanostatic techniques, aluminium was electrodeposited from the deep eutectic solvent (n(AlCl3):n(urea)=1.6:1) onto glassy carbon and aluminium substrates at temperatures ranging from 25 to 50 °C. Using SEM, EDS and XRD techniques, substrates were studied and confirmed the presence of aluminium deposits following both potentiostatic and galvanostatic regimes. The shape and size of Al grains deposited depended on the time of deposition and varied in size from nanometers to micrometers and in shape from regular crystal forms to needle-like and flake-like structures.
Key words: aluminium; electrodeposition; deep eutectic solvent (DES); AlCl3-urea