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Cu2+和H2O2类芬顿反应促进钨的高效化学机械抛光
陈泓谕,王 林,彭 枫,沈蒙蒙,杭 伟,Tufa Habtamu BERI,张惠斌,赵 军,韩云晓,吕冰海
中国有色金属学报(英文版) ›› 2025, Vol. 35 ›› Issue (1) : 257-270.
PDF(5967 KB)
PDF(5967 KB)
Cu2+和H2O2类芬顿反应促进钨的高效化学机械抛光
({{custom_author.role_cn}}), {{javascript:window.custom_author_cn_index++;}}Efficient chemical mechanical polishing of W promoted by Fenton-like reaction between Cu2+ and H2O2
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