Influence of oxygen partial pressure on properties of
N-doped ZnO films deposited by magnetron sputtering
WANGJin-zhong(王金忠),E.ElANGOVAN,N.FRANCO, A.ALVESE,A.REGO,R.MARTINS,E.FORTUNATO
Influence of oxygen partial pressure on properties of
N-doped ZnO films deposited by magnetron sputtering
WANGJin-zhong(王金忠),E.ElANGOVAN,N.FRANCO, A.ALVESE,A.REGO,R.MARTINS,E.FORTUNATO
中国有色金属学报（英文版）
.
2010, (12): 2326
-2330
.
