高功率等离子磁控溅射法制备含钛类金刚石碳膜
YANGPeng,SUNGChia-chi,FUHYiin-Kuen,CHUChun-lin,LOChih-hung
Ti-containing hydrogenated carbon films fabricated by high-power plasma magnetron sputtering
YANGPeng,SUNGChia-chi,FUHYiin-kuen,CHUChun-lin,LOChih-hung
中国有色金属学报(英文版)
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2012, (6): 1381
-1386
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