ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 9    No. 3    September 1999

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Sputtering of W-Mo alloy under ion bombardment
Li Chengming(李成明)1  Tian Linhai(田林海) 1  Xu Zhong(徐 重) 1  Xie Xishan(谢锡善) 2   Dong Jianxin(董建新) 2
(1.Research Institute of Surface Engineering,Taiyuan University of Technology, Taiyuan 030024, P.R.China;
2.Department of Materials Science and Engineering,University of Science and Technology Beijing, Beijing100083,P.R.China
)
Abstract: The distribution of plasma density in the vicinity of the W-Mo alloy source in the process of double-glow discharge plasma surface alloying was diagnosed using the moveable Langmuir probe. The sputtering law, surface composition and morphological variation of the W-Mo alloy source was studied. The experimental results show that there exists obvious preferential sputtering on the surface of the W-Mo alloy source under the argon ion bombardment; the stable period is reached after a transitional period, and the preferential sputtering occurs in a definite range of composition(mole fraction): 70%~75%Mo, 22%~25%W; there appears segregation on the surface of the W-Mo alloy source.
Key words: metallic cementation; W-Mo alloy; preferential sputtering; ion bombardment
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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