Cu2+和H2O2类芬顿反应促进钨的高效化学机械抛光
陈泓谕，王 林，彭 枫，沈蒙蒙，杭 伟，Tufa Habtamu BERI，张惠斌，赵 军，韩云晓，吕冰海
Efficient chemical mechanical polishing of W promoted by Fenton-like reaction between Cu2+ and H2O2
Hong-yu CHEN, Lin WANG, Feng PENG, Meng-meng SHEN, Wei HANG, Tufa Habtamu BERI, Hui-bin ZHANG, Jun ZHAO, Yun-xiao HAN, Bing-hai Lü
中国有色金属学报（英文版）
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2025, (1): 257
-270
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DOI: 10.1016/S1003-6326(24)66678-1
