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Electrochemical characteristic of chemical-mechanical polishing of copper with oxide passive film
HEHan-wei(何捍卫),HUYue-hua(胡岳华),ZHOUKe-chao(周科朝),XIONGXiang(熊翔),HUANGBai-yun(黄伯云)
Electrochemical characteristic of chemical-mechanical polishing of copper with oxide passive film
HEHan-wei(何捍卫),HUYue-hua(胡岳华),ZHOUKe-chao(周科朝),XIONGXiang(熊翔),HUANGBai-yun(黄伯云)
中国有色金属学报(英文版) . 2003, (04): 977 -981 .