Electrochemical behavior and polishing properties of silicon wafer in alkaline slurry with abrasive CeO2

SONG Xiao-lan(宋晓岚), XU Da-yu(徐大余), ZHANG Xiao-wei(张晓伟),SHI Xun-da(史训达), JIANG Nan(江 楠), QIU Guan-zhou(邱冠周)

Transactions of Nonferrous Metals Society of China ›› 2008, Vol. 18 ›› Issue (01) : 178-178.

The Nonferrous Metals Society of China
Transactions of Nonferrous Metals Society of China ›› 2008, Vol. 18 ›› Issue (01) : 178-178.
Functional Materials

Electrochemical behavior and polishing properties of silicon wafer in alkaline slurry with abrasive CeO2

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2008, 18(01): 178-178

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