In order to extend the application range of solid lubricant MoSe₂, a two-step process was adopted to prepare the MoSe₂ film. Namely, the MoSe_x precursor layer was firstly deposited on the substrate by magnetron sputtering method, and then selenized in a Se vapor atmosphere to obtain MoSe₂ film. The effects of the sputtering and selenization process on the structure and tribological properties of the films were investigated. The results show that the two-step prepared MoSe₂ films exhibit a preferential orientation with (002) basal plane parallel to the substrate and an improved crystallinity. The prepared MoSe₂ film has good wear resistance and lubricating performance in an ambient air environment, with the lowest average friction coefficient of 0.0443 and a specific wear rate of 1.03×10^-5 mm³/(N·m). In addition, the lubrication effects of MoSe₂ films through the adhesion mechanism and fill in-repair mechanism were further discussed.