An electrochemical deposition strategy for discrete Cr nano-nuclei to achieve ultrathin Cu foil stripping was proposed. The results indicated that this method could be utilized to prepare Cu foils with a thickness of about 1.34 μm. The Cr discrete nucleus density directly affects the stripping performance, surface roughness, and resistivity of Cu foils. Under our experimental conditions, the stripping performance of Cu foil was the best at a Cr discrete nucleus density of 15.7×10⁹ cm^-2 and resistivity of 4.95×10^-7 Ω·m, 9.2% lower than that of conventional Cr coating of 0.67 μm in thickness and 15.8% lower than that of the coating with potassium dichromate, and the tensile strength exceeds 248.80 MPa.